Formation of contacts on semiconductor substrates,申请号GB20020024689-传众专利搜索

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发明名称	Formation of contacts on semiconductor substrates
摘要
申请公布号	GB0224689(D0)	申请公布日期	2002.12.04
申请号	GB20020024689	申请日期	2002.10.23
申请人	SIMAGE OY	发明人
分类号	H01L21/00;H01L31/00;H01L31/0224;H04N3/00;H04N3/15	主分类号	H01L21/00
代理机构		代理人
主权项
地址

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