发明名称 METHOD FOR MAKING GROUP III NITRIDE THIN MEMBRANE
摘要 PROBLEM TO BE SOLVED: To control the polarity of a GaN-based group III nitride thin membrane to (0001). SOLUTION: After irradiating the sapphire C surface 28 of a sapphire substrate 21 with nitrogen ion and forming an AlN layer, a GaN-based group III nitride thin membrane is formed on the surface of the AlN layer. The GaN- based group III nitride thin membrane (0001) is grown, if the surface of the AlN layer is clean.
申请公布号 JP2002348199(A) 申请公布日期 2002.12.04
申请号 JP20010160139 申请日期 2001.05.29
申请人 ULVAC JAPAN LTD 发明人 SONODA SAKI;SHIMIZU SABURO
分类号 C30B29/38;H01L21/203;H01L33/32;H01S5/323 主分类号 C30B29/38
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