发明名称 SELECTIVELY REFLECTING FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a selectively reflecting film by which deteriorations of color purity and resolution due to blurred hue or the like generated in the boundary part of pixels can be avoided, the color purity and the resolution of the selectively reflected hue can be made higher and more excellent and a mask can also be prevented from being stained. SOLUTION: This method for manufacturing the selectively reflecting film comprises, a step to form on a substrate a liquid crystal composition layer showing the smectic phase state, a liquid-crystalline state or a vitreous state by using a liquid crystal composition containing a liquid-crystal compound, a photo-reactive chiral compound and a polymerization initiator, a step to form an exposure amount distribution in the liquid-crystal composition layer by irradiating the liquid-crystal composition layer with first light, a step to form a selectively reflecting region according to the exposure amount distribution by raising the temperature of the liquid crystal composition layer with the exposure amount distribution to transit it into the liquid-crystal state, and a step to cure the selectively reflecting region-formed liquid-crystal composition layer by polymerization or cross-linking by irradiating the liquid-crystalline composition layer with second light.
申请公布号 JP2002350642(A) 申请公布日期 2002.12.04
申请号 JP20010159358 申请日期 2001.05.28
申请人 FUJI PHOTO FILM CO LTD 发明人 ICHIHASHI MITSUYOSHI
分类号 G02B5/20;C09K19/20;C09K19/22;C09K19/32;C09K19/46;C09K19/56;C09K19/58;G02B5/26;G02B5/30;G02F1/1335 主分类号 G02B5/20
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