| 摘要 |
PROBLEM TO BE SOLVED: To obtain a base polymer for a chemical amplification-type resist which is controlled to a structure having an acid sensitive part and a partially protected hydroxyl group part. SOLUTION: The novel alkenylphenol-based copolymer has a polymerization segment having the hydroxyl group selectively freed of a protective group having an acetal structure, a polymer segment having an acetal structure, and a polymer segment of the acrylic acid derivative having an ester part sensitive to an acid, and the novel copolymer is obtained by the treating with a weak acid of a novel copolymer formed by combining a polymer segment of an alkenylphenol derivative having the hydroxyl group protected with a protective group having an acetal structure, a polymerization segment of an alkenylphenol derivative which is protected with the protective group more resistant to an acid than the protective group having an acetal structure and a polymer segment of an acrylic acid derivative having an ester part relatively sensitive to an acid. |
