| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method which directly determines more or less amount of SiOH group in a surface containing siloxane bond using an instrumental analysis. SOLUTION: The method for analyzing the surface containing siloxane bond employs XPS. Si KLL auger electron spectrum and/or Si 2p photoelectron spectrum being generated by impinging non-monochromatic X-ray onto the surface are measured about not less than two kinds of samples containing siloxane bond. The kinetic energy Ek of the Si KLL auger electron and/or the bond energy Eb of the Si 2p photoelectron are obtained, and the obtained Ek and/or Eb are compared between above the not less than two kinds of samples, and thus the amount of SiOH group is determined whether more or less.</p> |
