NORBORNENE COPOLYMER FOR PHOTORESIST, METHOD FOR PRODUCING THE SAME AND PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a norbornene copolymer for a photoresist which has transparency, high sensitivity, high resolution and etching resistance in order to be suitable for fine fabricating ultrahigh integrated semiconductor by excimer laser; a method for producing the same; and a photoresist composition containing the same. SOLUTION: The norbornene copolymer for a photoresist comprises being represented by formula 1.