发明名称 SUBSTRATE STAGE FOR EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate stage for exposure device which suppresses the deflection of a printed circuit board and performs highly precise exposure. SOLUTION: A suction sheet 2 having very small pores 20 for suction is mounted on a substrate 3 and the substrate 3 has hollows 30 which are larger than the pores 20 for suction. The pores 20 for suction are communicated with the hollows 30 and, further, are communicated with a vacuum device via an air passage 31 and a bottom part passage 32. A diameter of the pores 20 for suction is made to be 0.4 mm or less and, thereby, the deflection such as causing exposure hindrance to the printed circuit board does not occur.
申请公布号 JP2002351082(A) 申请公布日期 2002.12.04
申请号 JP20010155131 申请日期 2001.05.24
申请人 ADTEC ENGINEENG CO LTD 发明人 IDA RYOICHI
分类号 G03F7/20;G03B27/60;H01L21/027;H05K3/00;(IPC1-7):G03F7/20 主分类号 G03F7/20
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