发明名称 |
Thin film, method and apparatus for forming the same, and electronic component incorporating the same |
摘要 |
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
|
申请公布号 |
US6488985(B1) |
申请公布日期 |
2002.12.03 |
申请号 |
US20000605339 |
申请日期 |
2000.06.28 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
HONDA KAZUYOSHI;ODAGIRI MASARU;TAKAHASHI KIYOSHI;ECHIGO NORIYASU;SUNAGARE NOBUKI |
分类号 |
B05B17/04;B05D7/24;C23C14/24;C23C14/56;G11B5/85;(IPC1-7):C23C16/448 |
主分类号 |
B05B17/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|