发明名称 Thin film, method and apparatus for forming the same, and electronic component incorporating the same
摘要 A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
申请公布号 US6488985(B1) 申请公布日期 2002.12.03
申请号 US20000605339 申请日期 2000.06.28
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 HONDA KAZUYOSHI;ODAGIRI MASARU;TAKAHASHI KIYOSHI;ECHIGO NORIYASU;SUNAGARE NOBUKI
分类号 B05B17/04;B05D7/24;C23C14/24;C23C14/56;G11B5/85;(IPC1-7):C23C16/448 主分类号 B05B17/04
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