| 摘要 |
A water spray subsystem apparatus and method of treating discharge gas designed for use in the gas discharge zone of a Czochralski crystal growing apparatus. The subsystem composes a structure containing or defining a water spray body, which is capable of providing a water spray into the discharge gas stream from the CZ chamber. The water is supplied into the discharge gas in the form of a spray or a mist in order to provide for intimate contact between the droplets of sprayed water and the discharge gas stream. Contacting the discharge gas stream with the water spray cools the gas stream, causes the reaction of SiO to SiO2, and causes the precipitation of cooled SiO2 and SiC out of the discharge gas stream.
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