Atomic force microscope for profiling high aspect ratio samples

摘要

Apparatus and methods are provided for using atomic force microscopy for profiling high aspect ratio features. Probe landing techniques include scanning prior to bringing the probe into contact with the feature. In one embodiment, the probe assembly cantilever is brought into contact with the feature and subsequent scanning is used to locate the feature with the probe. In another embodiment, the probe is moved in a scanning pattern in progressively lower horizontal planes until the probe contacts the sample feature. Also described is a deconvolution technique for deconvolving the sample image and a technique for measuring the tip radius of the feature.