APPARATUS AND METHOD FOR MEASURING TILT ANGLE IN SERIAL TYPE SEMICONDUCTOR ION IMPLANTATION EQUIPMENT

摘要

PURPOSE: An apparatus and a method for measuring a tilt angle in serial type semiconductor implantation equipment are provided to measure a practical ion implantation angle by forming a light source on a chamber wall and installing a reflective plate on a platen. CONSTITUTION: A chamber wall(100) and a platen(102) are installed in the inside of semiconductor implantation equipment. A beam terminal plate(104) is formed on the chamber wall(100). The beam terminal plate(104) is used for displaying a reflective beam reflected from a reflective plate(108). A light source(106) can be formed as a laser beam generator. The light source(106) is vertically formed on a predetermined position of the beam terminal plate(104). The light source(106) is connected with a power supply. The reflective plate(108) is used for reflecting the laser beam provided from the light source(106).