发明名称 |
SEMICONDUCTOR MANUFACTURING FACILITY HAVING FUNCTION DETECTING LEAKAGE OF VACUUM LINE |
摘要 |
PURPOSE: A semiconductor manufacturing facility having function detecting leakage of a vacuum line is provided to perform easily a leak test by inserting a shielding layer of a circular structure between joints of a vacuum line. CONSTITUTION: A center ring(200) is formed with a sus ring(35) and a viton O-ring(36). The center ring(200) is a shielding layer of a circular structure having an airtight inside(37). The viton O-ring(36) is inserted into a groove formed on a center of the sus ring(35) having constant thickness in order to prevent leakage of pressure from each connection part. The inside(37) of the center ring(200) has predetermined thickness. The center ring(200) is formed as a raw material such as stainless alloy. A vacuum line is formed with a plurality of joints. The vacuum line is used for transferring air from the inside of the chamber to a pump portion.
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申请公布号 |
KR20020089610(A) |
申请公布日期 |
2002.11.30 |
申请号 |
KR20010028375 |
申请日期 |
2001.05.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAE, YEONG IL |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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