LOAD-ROCK APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A load-rock apparatus for manufacturing semiconductor devices is provided to minimize a damage of a wafer by reducing thermal stress of wafer. CONSTITUTION: The load-rock apparatus comprises a load-rock chamber(10) and a load-rock station(12) formed in the load-rock chamber(10) for loading a plurality of wafers. The load-rock station(12) further includes a housing(14) opened front and back surfaces of the housing and a plurality of slits(16) formed at both sides of the housing. A protrusion part(18) is formed on the slit(16) for loading the wafer. Since the wafer contact area is reduced by using the protrusion part(18), the thermal stress of the wafer is minimized.