发明名称 |
APPARATUS AND METHOD FOR MEASURING TILT ANGLE IN DISC TYPE SEMICONDUCTOR ION IMPLANTATION EQUIPMENT |
摘要 |
PURPOSE: An apparatus and a method for measuring a tilt angle in disc type semiconductor ion implantation equipment are provided to measure a practical ion implantation angle by forming a light source such as a laser beam generator on a chamber wall and mounting a reflective plate on a disc pad. CONSTITUTION: A chamber wall(200) and a disc pad(202) are installed in the inside of semiconductor implantation equipment. A beam terminal plate(204) is formed on the chamber wall(200). The beam terminal plate(204) is used for displaying a reflective beam reflected from a reflective plate(208). A light source(206) can be formed as a laser beam generator. The light source(206) is vertically formed on a predetermined position of the beam terminal plate(204). The light source(206) is connected with a power supply. The reflective plate(208) is used for reflecting the laser beam provided from the light source(206).
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申请公布号 |
KR20020089916(A) |
申请公布日期 |
2002.11.30 |
申请号 |
KR20010028939 |
申请日期 |
2001.05.25 |
申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
KIM, GYU SEONG;LEE, MU HYEONG |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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