APPARATUS FOR CLEANING COATER CUP

摘要

PURPOSE: An apparatus for cleaning a coater cup is provided to perform effectively a cleaning process by using a dispense nozzle to inject a cleaning solution and determining a size and a position of an injection hole of a cleaning wafer according to the amount of photoresist. CONSTITUTION: A lower cup(11) has a plurality of shielding walls(11a). The lower cup(11) has an opened upper portion. An external cup(12) is used for preventing an escape of photoresist. An internal cup(13) is located in the inside of the external cup(12). The internal cup(13) is used for preventing inflow of the photoresist into the inside of the shielding walls(11a). A spin chuck(14) is located on a center of the cups(11-13). A driving portion(15) drives the spin chuck(14). A dispense nozzle(16) is installed at an upper portion of the external cup(12). The dispense nozzle(16) is used as a cleaning solution injection nozzle. A cleaning solution is injected by using the centrifugal force.