发明名称 |
GAS INLET MEMBER OF PLASMA TREATMENT EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a gas inlet member of a plasma treatment equipment such as a plasma CVD equipment by which the occurrence of reverse discharge toward the gas influx portion (on the upper electrode side) can be prevented at the time of the excitation of plasma. SOLUTION: The gas inlet member of the plasma treatment equipment has a heat-resisting hollow-body element 2, a hollow-body part 3 for ventilation provided in the heat-resisting hollow-body element 2 and a heat-resisting porous element 4 housed in the hollow-body part 3.
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申请公布号 |
JP2002343788(A) |
申请公布日期 |
2002.11.29 |
申请号 |
JP20010151214 |
申请日期 |
2001.05.21 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
ICHIKAWA HIROYUKI;TAKAHASHI KENJI;UEMOTO HIDEO |
分类号 |
C23C16/455;H01L21/31;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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