| 摘要 |
PROBLEM TO BE SOLVED: To provide an inductive coupling plasma igniting method by which leakage by dielectric breakdown is not caused, and an article to be treated does not incur charge-up damage by plasma. SOLUTION: Low-energy and low-density plasma is ignited in a state low in all of high-frequency output, flow rate of a reactive gas and pressure within a chamber, and all the high-frequency output, flow rate of the reactive gas and pressure within the chamber are gradually increased after the ignition of plasma is confirmed, thereby finally generating low-energy and high-density plasma capable of treating an article to be treated. |
