| 摘要 |
PROBLEM TO BE SOLVED: To provide a peripheral exposing system in which an irradiating region at the notch part of a wafer is prevented from moving in V-shape to expose a region in the wafer not required to be exposed. SOLUTION: The peripheral exposing system for irradiating the peripheral part of a wafer, provided with a notch at the outer circumferential part thereof, with exposing light while turning the wafer comprises a wafer edge detecting means moving mechanism for moving the sensor light projecting/receiving section substantially in the central direction of the wafer, and a control section for controlling the wafer edge detecting means moving mechanism such that the edge part of the wafer is irradiated with a constant quantity of sensor light and for controlling an irradiating region moving mechanism to move by the same amount as an wafer edge detecting means. When a signal indicating the start of the notch is received by the wafer edge detecting means, operation of the exposing light irradiating region moving mechanism is interrupted and the operation is resumed upon elapsing a specified time or upon receiving a signal indicating the end of the notch.
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