| 摘要 |
PURPOSE: A substrate supporting apparatus is provided to obtain a thin film having a uniform thickness by effectively preventing the substrate from being deformed by its weight and temperature rise. CONSTITUTION: A substrate supporting apparatus comprises a substrate supporting unit(10) for mechanically supporting a non-deposition portion(1a) where an organic material(7) is not substantially deposited, from among the surfaces where the organic material is deposited; and a vacuum adsorption unit(20) for adsorbing, through the use of vacuum, the surface opposite to the surface where the organic material is deposited. The substrate supporting unit includes a main body(11) having an open bottom portion; and a support portion(12) protruded inward from the front end of the main body, and which supports the non-deposition portion.
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