| 摘要 |
PROBLEM TO BE SOLVED: To enable stable end point detection by making reaction product difficult to stick on an inside (vacuum side) surface of a viewing port, in the case that the number of treated substrates is increased. SOLUTION: A shield plate 10 for isolating a chamber A in which a substrate 1 to be treated is subjected to plasma treatment from a chamber B interconnected with discharge means 2 is installed in a vacuum vessel 1, and the vacuum vessel 1 and the shield plate 10 are grounded. The shield plate 10 has a hole. The viewing port 13 is installed in the chamber B which is isolated by the shield plate 10 and interconnected with the discharge means, and an end point detector 14 of plasma treatment is installed on the viewing port. Thereby leakage of plasma from the chamber in which plasma treatment is performed is prevented, reaction product is hardly stuck on the inside surface of the viewing port, and stable end point detection is enabled. |
