THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE: A thinner composition is provided, to remove the remaining photosensitive resin composition used in the preparation process of a semiconductor device and a liquid crystal display device. CONSTITUTION: The thinner composition comprises 1-50 parts by weight of a propylene glycol monoalkyl ether; 50-99 parts by weight of an alkyl ethanoate; 0.001-1 parts by weight of a fluorinated acrylic copolymer surfactant; and 0.001-1 parts by weight of a polyethylene oxide condensate surfactant of a nonionic alkylphenol. Preferably the propylene glycol monoalkyl ether is selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether and propylene glycol monobutyl ether; and the alkyl ethanoate is selected from the group consisting of methyl ethanoate, ethyl ethanoate, isopropyl ethanoate, n-propyl ethanoate and butyl ethanoate. The fluorinated acrylic copolymer surfactant has a surface tension of 24.0 mN/m (by Wilhelmy method) on ethyl lactate.