发明名称 |
METHOD AND DEVICE FOR GROWING CRYSTAL AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To grow a crystal which is uniform also in the peripheral portion of a substrate as is in its central portion. SOLUTION: This method for growing a crystal includes the steps of: arranging a substrate 5 and a dummy substrate 8 shaped like a doughnut outside the substrate 5 in a treatment space in a crystal growing device; setting various treatment conditions including the temperature and the degree of vacuum of the treatment space and the amount of supply of a treatment gas; supplying a predetermined gas into the treatment space to form a crystalline layer on the principal surface of the substrate; arranging a susceptor 9 having a groove 10 responding to the peripheral edge of the substrate and having a predetermined width in the treatment space; and arranging the substrate on the principal surface of the susceptor 9 such that the peripheral edge of the substrate is at the groove and the dummy substrate shaped like a doughnut to surround the substrate. A crystal is grown while the susceptor 9 is being turned. One layer or a plurality of layers made of a compound semiconductor is formed by a MOCVD method.
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申请公布号 |
JP2002343727(A) |
申请公布日期 |
2002.11.29 |
申请号 |
JP20010150731 |
申请日期 |
2001.05.21 |
申请人 |
HITACHI LTD;HITACHI TOBU SEMICONDUCTOR LTD |
发明人 |
SASAKI SHINJI;UEHARA HIROAKI;YANAGISAWA HIRONORI;KATO YOSHIAKI |
分类号 |
C23C16/46;H01L21/205;H01S5/026;(IPC1-7):H01L21/205 |
主分类号 |
C23C16/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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