| 摘要 |
PURPOSE: A fabrication method of a phase shift mask is provided to improve a productivity by compensating for a phase difference and a transmittance between a carbon film deposited on a clear defect portion and a normal pattern. CONSTITUTION: When a clear defect is generated in mask manufacturing processes, a carbon film(60) is deposited on clear defect portions of a quartz substrate(10). A carbon hole is formed at center portion of the deposited carbon film(60) in order to have a phase difference of 180 degree with a normal transmitting pattern. A quartz hole(90) is then formed by selectively etching the exposed quartz substrate(10) using the carbon hole.
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