| 摘要 |
PROBLEM TO BE SOLVED: To provide an inductively coupled plasma processor equipped with a Faraday shield which enables the improvement of ignition quality of plasma and the suppression of capacitively coupled type plasma generation in parallel. SOLUTION: The inductively coupled plasma processor is equipped with a chamber for plasma processing, a coil electrode which is provided at the periphery of the chamber for plasma processing, and the Faraday shield which is arranged between the coil electrode and chamber for plasma processing. The Faraday shield has a plurality of longitudinally long cuts which are arranged in the circumferential direction of the chamber for plasma processing, and a dielectric is inserted between a chamber surface for plasma processing which is exposed through the cuts and the coil electrode. |
