发明名称 SILICON EMITTER HAVING HEAVILY DOPED CONTACT LAYER WITH LOW POROSITY
摘要 <p>PROBLEM TO BE SOLVED: To provide a porous silicon emitter reduced in series contact resistance between an active porous silicon layer and an electrode. SOLUTION: The porous silicon made emitter comprises an electron injection layer 1 including a front face 2 and a back face 4, an active layer 3 comprising a porous silicon material, having high porosity contacting the front face 2, the contact layer 5 contacting the active layer 3 and comprising a porous silicon material with low porosity which includes a boundary surface 12, and an n-type heavily-doped region 8 extending inside the boundary surface 12. The n-type heavily doped region 8 which low resistivity.</p>
申请公布号 JP2002343228(A) 申请公布日期 2002.11.29
申请号 JP20020125567 申请日期 2002.04.26
申请人 HEWLETT PACKARD CO <HP> 发明人 MORI NATSU;KOSHIDA NOBUYOSHI;KUO HUEI-PEI
分类号 H01J1/312;H01J1/308;H01J9/02;(IPC1-7):H01J1/308 主分类号 H01J1/312
代理机构 代理人
主权项
地址