BATH PLATE OF CLEANING APPARATUS

摘要

PURPOSE: A bath plate of a cleaning apparatus is provided to easily achieve uniform cleaning and etching processes over an entire surface of a wafer by controlling a flow of process solutions. CONSTITUTION: A bath plate(10) includes a plurality of inlets(11) of processing solutions. The processing solutions are to be inflowed to a center portion of rear of the bath plate(10). The inlets(11) having a plurality of holes are formed at the rear surface of the bath plate(10). At this time, the diameter of the inlet(11) is inversely proportional to the inflow pressure of the bath plate(10). That is, the diameter of the inlet(11) is biggest at the center portion of the bath plate(10).