| 摘要 |
Cast-on-resist (COR) methods of manufacturing patterned ceramic layers that can be used in forming a multilayered ceramic device are provided according to preferred exemplary embodiments of the present invention. The COR methods are comprised of processing steps that are conducted on a transporting system and include: depositing a resist on a substrate (102) and selectively exposing the resist to a radiation source (104) such that a first portion of the resist having a positive image of the pattern is soluble in a solvent and a second portion of the resist having a negative image of the pattern is insoluble in the solvent, immersing the resist in the solvent to remove the first portion to form a casting substrate having the negative image of the pattern (106), applying ceramic slurry on the casting substrate (204), curing the ceramic slurry on the casting substrate (206), and removing the ceramic slurry from the casting substrate after the curing such that a patterned ceramic layer is formed for use in a multilayered ceramic device (208).
|
