发明名称 Field effect transistor and method for making the same
摘要 The field effect device consisting of a substrate, a conducting backplane formed in the substrate, a source and a drain disposed above the conductive backplane, a gate insultatively disposed above the substrate between the source and drain, and a backgate contact electrically coupled to the conducting backplane.
申请公布号 US2002175346(A1) 申请公布日期 2002.11.28
申请号 US20020147550 申请日期 2002.05.17
申请人 RAYTHEON COMPANY 发明人 BRAR BERINDER
分类号 H01L21/335;H01L29/10;H01L29/423;H01L29/778;(IPC1-7):H01L31/032;H01L35/26;H01L21/336 主分类号 H01L21/335
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