SYSTEM AND PROCESS FOR ANALYSIS OF SEMICONDUCTOR SAMPLES

摘要

A system and method for analysis of multi-layered semiconductor samples (29) by measuring and analyzing Hall data generated by up to four samples (29) simultaneously. The Hall data are processed and analyzed by seamlessly integrated analysis software for multi-carrier analysis which includes the use of a Hybrid Analysis procedure (110) and statistical techniques to deduce confidence intervals for the derived properties and for the statistical significance (130) of each of the carriers. As part of the Hybrid Analysis procedure, the number of carrier is determined from the Mobility Spectrum Analysis, and a Discrete Carrier Fit (140) is further applied to the measured Hall data to obtain values for the layer properties with higher accuracy. The process disclosed includes sample preparation using a self-adhesive polymer film (32) masking material, which is stamped out with a tool designed for this purpose to generate a specifically contoured mask (36). The polymer mask (36) protects the sample surface during etching, which can be done chemically or by particle blasting.