发明名称 |
Test station for polishing head of chemical-mechanical polishing arrangement has indicator showing status representing reliability of polishing head |
摘要 |
The test station has a base element, a head adapter, a fluid line connected to a source of fluid under pressure and a vacuum source, whereby the fluid line can be connected to the polishing head to apply a raised pressure vacuum to the head. An indicator indicates a status representing the reliability of the polishing head. A wafer loss sensor test element receives a signal from a wafer loss sensor of the polishing head under test. AN Independent claim is also included for the following: a method of assessing the reliability of a polishing head.
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申请公布号 |
DE10123386(A1) |
申请公布日期 |
2002.11.28 |
申请号 |
DE2001123386 |
申请日期 |
2001.05.14 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
AUGUSTIN, MIRKO;KRAMER, JENS |
分类号 |
B24B37/005;B24B37/04;B24B37/30;(IPC1-7):B24B37/04;H01L21/302 |
主分类号 |
B24B37/005 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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