发明名称 Test station for polishing head of chemical-mechanical polishing arrangement has indicator showing status representing reliability of polishing head
摘要 The test station has a base element, a head adapter, a fluid line connected to a source of fluid under pressure and a vacuum source, whereby the fluid line can be connected to the polishing head to apply a raised pressure vacuum to the head. An indicator indicates a status representing the reliability of the polishing head. A wafer loss sensor test element receives a signal from a wafer loss sensor of the polishing head under test. AN Independent claim is also included for the following: a method of assessing the reliability of a polishing head.
申请公布号 DE10123386(A1) 申请公布日期 2002.11.28
申请号 DE2001123386 申请日期 2001.05.14
申请人 ADVANCED MICRO DEVICES, INC. 发明人 AUGUSTIN, MIRKO;KRAMER, JENS
分类号 B24B37/005;B24B37/04;B24B37/30;(IPC1-7):B24B37/04;H01L21/302 主分类号 B24B37/005
代理机构 代理人
主权项
地址