发明名称 |
SEMICONDUCTOR PRESSURE SENSOR |
摘要 |
PROBLEM TO BE SOLVED: To suppress the variation of an output of as diaphragm type semiconductor pressure sensor using a semiconductor substrate having a main surface to be the (100) face due to the creep stress of metal wirings even when the detectable pressure is intended to be very low. SOLUTION: A pressure detecting diaphragm 12, diffused gage resistances Rc, Rs for outputting a detection signal based on the resistance change due to the strain of the diaphragm 12 and metal wirings 21-24 for on an outer thick walled portion of the diaphragm 12 are formed on a main surface 11 being the (110) face of a rectangular plate-like silicon substrate 10 and the ratio of the diaphragm area S (μm<2> ) to the thickness d (μm), S/D, is greater than 100μm. The area of portions of the metal wirings 21-24 located at a first parallel side 10a of the substrate 10 to a crystal axis <110> is greater than that of their portions located at a second parallel side 10b to the axis <110>.
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申请公布号 |
JP2002340713(A) |
申请公布日期 |
2002.11.27 |
申请号 |
JP20010140556 |
申请日期 |
2001.05.10 |
申请人 |
DENSO CORP;NIPPON SOKEN INC |
发明人 |
TOYODA INEO;YOSHIDA TAKAHIKO;ODA KIYOSHIGE |
分类号 |
G01L9/04;G01L9/00;H01L29/04;H01L29/84;(IPC1-7):G01L9/04 |
主分类号 |
G01L9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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