发明名称 |
SILICA MESO-STRUCTURE THIN FILM, MESO-POROUS SILICA THIN FILM, METHOD FOR FORMING SILICA MESO-STRUCTURE THIN FILM AND METHOD FOR FORMING MESO-POROUS SILICA THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To propose a silica meso-structure thin film and a meso-porous silica thin film, which are each formed on an optional substrate and has orientation. SOLUTION: The silica meso-structure thin film is formed on a high molecular compound film provided on the substrate and is formed on a part or the whole of high molecular compound film having a surface, on which structural anisotropy is given by the irradiation with linearly polarized light. The meso- porous silica thin film is formed by removing a surfactant from the fine pores of the meso-structure and is composed of hollow structural fine pores.
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申请公布号 |
JP2002338229(A) |
申请公布日期 |
2002.11.27 |
申请号 |
JP20010140184 |
申请日期 |
2001.05.10 |
申请人 |
CANON INC |
发明人 |
MIYATA HIROKATSU |
分类号 |
B01D67/00;B01D69/12;B01D71/02;B01J19/12;B01J20/10;B01J20/28;B01J20/32;C01B33/12;C01B37/02;(IPC1-7):C01B33/12 |
主分类号 |
B01D67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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