发明名称 SILICA MESO-STRUCTURE THIN FILM, MESO-POROUS SILICA THIN FILM, METHOD FOR FORMING SILICA MESO-STRUCTURE THIN FILM AND METHOD FOR FORMING MESO-POROUS SILICA THIN FILM
摘要 PROBLEM TO BE SOLVED: To propose a silica meso-structure thin film and a meso-porous silica thin film, which are each formed on an optional substrate and has orientation. SOLUTION: The silica meso-structure thin film is formed on a high molecular compound film provided on the substrate and is formed on a part or the whole of high molecular compound film having a surface, on which structural anisotropy is given by the irradiation with linearly polarized light. The meso- porous silica thin film is formed by removing a surfactant from the fine pores of the meso-structure and is composed of hollow structural fine pores.
申请公布号 JP2002338229(A) 申请公布日期 2002.11.27
申请号 JP20010140184 申请日期 2001.05.10
申请人 CANON INC 发明人 MIYATA HIROKATSU
分类号 B01D67/00;B01D69/12;B01D71/02;B01J19/12;B01J20/10;B01J20/28;B01J20/32;C01B33/12;C01B37/02;(IPC1-7):C01B33/12 主分类号 B01D67/00
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