| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer which contains repeating units derived from perfluoro-2,2-dimethyl-1,3-dioxole; and a chemical-amplification-type resist composition containing the same. SOLUTION: This resist composition contains (a) a photosensitive polymer comprising (a-1) repeating units represented by the formula and derived from perfluoro-2,2-dimethyl-1,3-dioxole and (a-2) at least one kind of repeating unit selected from the group consisting of repeating units derived from vinyl compounds and repeating units derived from norbornene compounds and (b) a photoacid generator(PAG). |
