| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer compound which is sensitive to a high-energy ray, is excellent in sensitivity, resolution, and etching resistance, and hence is useful for fine processing using an electron beam or ultraviolet rays. SOLUTION: This polymer compound has a wt. average mol.wt. of 1,000-500,000 and contains repeating units represented by formulas (1) and (2) [W is a 2-15C divalent group and forms, together with the carbon atom to which W is bonded, a 5- or 6-membered cyclic ketone, lactone, cyclic carbonate, cyclic acid anhydride, or cyclic imide; Y is O or NR<1> (R<1> is H or a 1-15C linear, branched or cyclic alkyl group); and k is 0 or 1] and at least one kind of unit decomposable under acidic conditions to generate a carboxylic acid. |
