MANUFACTURING METHOD OF THERMAL INFRARED SOLID-STATE IMAGE SENSOR, AND THERMAL INFRARED SOLID-STATE IMAGE SENSOR

摘要

PROBLEM TO BE SOLVED: To provide a thermal infrared solid-state image sensor with a high infrared detection sensitivity and a short thermal time constant. SOLUTION: In this thermal infrared solid-state image sensor provided with a detection part and a signal processing part for processing a signal transmitted from the detection part, which are provided on the same silicon substrate, the thickness of the insulating film of the detection part is set smaller than that of the interlayer separation layer of the signal processing part.