Method of reducing plasma charge damage for plasma processes,申请号EP20010124618-传众专利搜索

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发明名称	Method of reducing plasma charge damage for plasma processes
摘要
申请公布号	EP1227172(A3)	申请公布日期	2002.11.27
申请号	EP20010124618	申请日期	2001.10.15
申请人	APPLIED MATERIALS, INC.	发明人	ISHIKAWA, TETSUYA;DEMOS, ALEXANDROS T.;CHO, SEON-MEE;GAO, FENG;NIAZI, KAVEH F.;ARUGA, MICHIO
分类号	C23C16/52;C23C16/455;H01L21/205;H01L21/302;H01L21/31;(IPC1-7):C23C16/455	主分类号	C23C16/52
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