| 摘要 |
PURPOSE: A chemical vapor deposition device is provided to prevent the bending of electric fields in a chamber around a center pin by grounding the center pin, thereby preventing the stain generated around the center pin due to the difference of a deposition film. CONSTITUTION: A chemical vapor deposition device includes a substrate voltage source for supplying a substrate voltage, a susceptor(45) to which a substrate(37) is positioned, center pins(42) penetrating the susceptor for lifting the substrate, and ground elements(GND) connecting the center pin to the substrate voltage source to ground, wherein the center pins respectively have a head part contacting the substrate and a head supporting part for supporting the head part, and the ground elements are formed to the head part or the head supporting part.
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