POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in resolution and exposure margin, which can be suitably used for microphotofabrication using far-UV rays, particularly ArF excimer laser light. SOLUTION: The positive resist composition contains (A) a specified resin which has aliphatic cyclic hydrocarbon groups and increases the dissolving rate with respect to an alkali developer by the effect of an acid and (B) a specified compound which produces an acid by irradiation with active rays or radiation.