PURPOSE: A marangoni type wafer cleaning equipment is provided to prevent the leakage of solvent vapor flowing into a drying and washing unit so that the efficiency of cleaning process of a wafer is improved. CONSTITUTION: A marangoni type wafer cleaning equipment includes a storing part for solvent(B) and a drying part for a wafer(34) and a washing unit surrounded by the upper hood(206) and a housing(208) respectively. The upper hood is arranged without any separation with the housing in order to prevent the leakage of the solvent vapor inside the drying and washing room. A heater(201) in liquid tank(200) is installed to increase the vapor pressure of solvent. The third pipe is equipped to avoid overload of vapor pressure caused by heating and a control valve(205) is used to make the pressure constant.
申请公布号
KR20020088233(A)
申请公布日期
2002.11.27
申请号
KR20010027298
申请日期
2001.05.18
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KO, YONG GYUN;LIM, GWANG SIN;RYU, JAE JUN;SON, IL HYEON