| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method for a matrix substrate for liquid crystal which can decrease the number of photomasks used for a manufacturing process for a TFT active matrix substrate, etc. SOLUTION: On a glass substrate 1, a TFT active matrix circuit is formed by using two sheet of photomasks and on it, an acryl-based resin film 10 is formed as an electric insulating film which has a flat top surface. A resist layer 11 is formed thereupon and half-tone exposure whose exposure quantity is adjusted is carried out and a through hole which reaches the matrix circuit is formed by etching in a contact hole area and a recess 10a is formed by ashing in a pixel electrode formation area except the through hole. A transparent conductive film 12 is formed covering the top surface and a flattening film 13 is formed thereupon and the entire surface is etched until the acryl-based resin film 10a in the area except the through hole and recess is exposed to pattern pixel electrodes 12a, and contact hole processing and pixel electrode patterning are carried out by a sheet of photomask.</p> |
