| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus capable of being efficiently operated by easily keeping high vacuum, having resistance against thermal shock and is lightweight, easily maintained and recyclable. SOLUTION: In this vacuum vapor deposition apparatus, a raw material storage body 2 is disposed inside a vacuum vessel 1 maintained in a vacuum state, the raw material in the raw material storage body 2 is heated by electronic beam 4 to generate vapor 6 of the raw material. The vapor 6 is deposited on a deposition plate 7, and an in-furnace structural body 21 is disposed around the raw material storage body 2 to prevent any leakage of the vapor not utilized for the deposition. The in-furnace structural body 21 is constituted of the substrate treated at high temperatures by executing ceramic coating 23 on a carbon substrate 22 with heat resistance and thermal shock resistance to prevent corrosion by the raw material and sticking of the raw material to the substrate.
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