发明名称 LIQUID JET HEAD AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a liquid jet head and its manufacturing method whereby an opening width of a liquid supply port of the side shooter type liquid jet head can be always accurately formed without depending on a state of an Si substrate which constitutes the head. SOLUTION: An Si crystal structure of a liquid supply port formation part at the front face side of the silicon substrate 1 having a surface crystal orientation of <100> is broken by injecting ions of impurities. The substrate 1 is anisotropically etched from a rear face. The anisotropic etching is made to reach a region 8 where the crystal structure is broken. Thereafter, the region 8 is etched and removed with the utilization of the feature that an etching speed of the region 8 where the crystal structure is broken is considerably high and the region has no anisotropic properties. As a result, the opening width at the front face side of the liquid supply port can be accurately formed to be nearly equal to a width of the region 8 without depending on the state of the Si substrate, and a distance between an end of the liquid supply port and a discharge energy-generating element can be formed highly accurately as designed.
申请公布号 JP2002337347(A) 申请公布日期 2002.11.27
申请号 JP20010144124 申请日期 2001.05.15
申请人 CANON INC 发明人 WATANABE HIDENORI;HAYAKAWA YUKIHIRO
分类号 B41J2/16;C23F1/00;C23F1/40;H01L21/306;(IPC1-7):B41J2/16 主分类号 B41J2/16
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