THERMAL ANNEAL METHOD FOR MAGNETIC TUNNEL JUNCTION DEVICE AND MAGNETIC TUNNEL JUNCTION DEVICE MANUFACTURED BY THE METHOD

摘要

PURPOSE: A magnetic tunnel junction device and a thermal anneal method thereof are provided to improve the TMR(Tunneling Magnetoresistance) rate and optimize the characteristics of the device in a shorter time more effectively by reducing the bent of an oxide layer(Tunnel Barrier Layer). CONSTITUTION: A magnetic tunnel junction device includes an anti-ferromagnetic layer formed of anti-ferromagnetic material, a fixed layer formed on the anti-ferromagnetic layer with a ferromagnetic material, a tunnel barrier layer(16) formed on the fixing layer with an electrically insulating material, and a free layer formed on the tunnel barrier layer with a ferromagnetic material, wherein the magnetic tunnel junction device is subject to rapid thermal anneal by heating at a temperature of 200-400°C for 10sec or less and cooled for 6min or less.