| 摘要 |
PROBLEM TO BE SOLVED: To provide a solution treatment apparatus with which the uniformity of the contact resistance with a substrate can easily be assured. SOLUTION: The first electrode of the solution treatment equipment comprises an electrode substrate formed with an aperture and plural auxiliary electrodes attached to this aperture. The plural auxiliary electrodes are suitably attached to the aperture of the electrode substrate, by which the points in contact with the substrate can be easily changed in correspondence to the patterns, etc., of the substrate. Consequently, the uniformity of the contact resistance can be easily assured.
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