| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-cleaning apparatus and a substrate-drying apparatus capable of cleaning and drying a substrate in a vertically disposed state without making it rotate, and provide a substrate-treating apparatus obtained by combining these substrate cleaning apparatus and substrate-drying apparatus. SOLUTION: This substrate-treating apparatus is provided with a cleaning tank 10 for receiving a cleaning solution Q, a substratesupporting mechanism 12 for supporting a substrate 11 within the cleaning tank 10, and a pump 13 for producing a stream of the cleaning solution Q received in the cleaning tank 10. Streams of the cleaning solution Q to the front and the rear sides of the substrate 11 disposed vertically and supported in the cleaning tank 10 by the substrate-supporting mechanism 12 are produced by the pump 13, and the front and the rear sides of the substrate 11 are cleaned simultaneously by the streams. Thus, since a rotating mechanism is not needed for the substrate, the problem of dust generated by a bearing, etc., causing contamination of the substrate can be avoided, and the horizontal area required to install the cleaning apparatus can also be reduced.
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