发明名称 EPITAXIAL COMPOUND SEMICONDUCTOR WAFER, MANUFACTURING METHOD THEREFOR, AND FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a field effect transistor, having a high current gain and a high withstand voltage, and to provide an epitaxial compound semiconductor wafer from which the transistor is manufactured, and to provide a method of manufacturing the wafer. SOLUTION: The field effect transistor, having a high current gain and a high breakdown voltage is obtained by simultaneously or alternately supplying an indium compound and at least one kind of compound selected from among an antimony compound, a bismuth compound, a tellurium compound, and a selenium compound to a part or all of the body of a phosphorous-containing compound semiconductor layer 7, contained in the compound semiconductor epitaxial wafer used for manufacturing the field effect transistor as parts of the raw materials.
申请公布号 JP2002334841(A) 申请公布日期 2002.11.22
申请号 JP20010137705 申请日期 2001.05.08
申请人 HITACHI CABLE LTD 发明人 TANAKA TAKESHI;TSUCHIYA TADAITSU;TAKANO KAZUTO
分类号 H01L29/201;H01L21/205;H01L21/338;H01L29/778;H01L29/812;(IPC1-7):H01L21/205 主分类号 H01L29/201
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