METHOD OF MANUFACTURING ALKALINE SOLUTION, THE ALKALINE SOLUTION, PATTERN-FORMING METHOD, RESIST FILM PEELING METHOD, CHEMICAL AGENT APPLYING DEVICE, WAFER-TREATING METHOD AND CHEMICAL AGENT SUPPLYING METHOD

摘要

PURPOSE: To prevent defects during the development of a resist film and the dimensional differences in a sparse and dense pattern. CONSTITUTION: A developer, in which gaseous molecules having oxidizing or reducing property are dissolved, is supplied from a developer supply nozzle 111 to a substrate 100 to be treated, on which surface an exposed photosensitive resist film is formed to develop the photosensitive resist film. Consequently, in-plane distribution of affinity between the resist film and a product is prevented, and the differences in development speeds that occur locally during developing are reduced. Furthermore, the reaction products are diffused rapidly into the developer, and sparse and dense dimension differences caused by differences in alkali concentrations are reduced.