LITHOGRAPHIC PROJECTION APPARATUS, DIFFRACTION MODULE, SENSOR MODULE, AND METHOD OF MEASURING WAVE FRONT ABERRATION

摘要

PROBLEM TO BE SOLVED: To provide a measuring system or lithographic projection apparatus that measures the wavefront aberration of a lithographic projector, without incorporating one or more exclusively used movable support structures. SOLUTION: An interferometer system has a grating pattern on the grating plane, and a movable pattern and a pinhole pattern, in such a manner as to make a projection beam go in and come out, and a detector. The detector has a detection plane which coincides with that in the downstream of the pinhole, substantially in the position relation, where spatial distribution of the pin hole disposed on the pinhole plate and the vibrational amplitude of the projecting beam in the electric field are associated in Fourier transform of the spatial distribution of the vibrational amplitude of the projecting beam in the pinhole plane.