发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition which can be subjected to direct writing with IR emitting solid and semiconductor lasers, etc., and has superior storage stability and burning stain resistance and to provide a photosensitive planographic printing plate and a method for producing a planographic printing plate. SOLUTION: The photosensitive composition contains an alkali-soluble resin, an IR absorbent and an antioxidant. This antioxidant is preferably a phosphorous ester compound and/or a mercaptoimidazole compound. Preferably a cyclic acid anhydride is further contained. The photosensitive planographic printing plate has a photosensitive layer comprising the photosensitive composition formed on a support. In the method for producing a planographic printing plate, the photosensitive layer of the photosensitive planographic printing plate is imagewise exposed with active light of >=700 nm wavelength and the exposed parts are dissolved in an alkaline developing solution and removed.
申请公布号 JP2002333707(A) 申请公布日期 2002.11.22
申请号 JP20010140038 申请日期 2001.05.10
申请人 KODAK POLYCHROME GRAPHICS JAPAN LTD 发明人 YUNO MARU
分类号 G03F7/004;B41C1/10;B41M5/36;G03F7/00 主分类号 G03F7/004
代理机构 代理人
主权项
地址