| 摘要 |
1,232,868. Coating by vapour deposition. CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE. Oct. 4, 1968 [Oct. 5, 1967], No.47259/68. Heading C7F. In the vapour deposition of a material from a source 1, a uniform deposit is obtained by providing relative movement between the substrate and a mask 6 having apertures shaped according to the formula. where a is the distance for a point to the axis of the beam, k is the number of apertures in the mask, E is the thickness of the deposit at the point, z the distance between the source and the mask, and I r the intensity of the beam. In a modification Fig. 4 (not shown) the substrate is reciprocated with respect to the mask. |
